Powall

About Powall

Powall offers research & development services and licensing of IP on scalable production of nanostructured materials based on atomic layer deposition (ALD).

ALD is a chemical deposition method to obtain conformal coatings of controllable thickness on many types of substrate. Together with the Powall intellectual property and know-how on scalable production of nanostructured materials, this allows for efficient precursor use for catalysts, encapsulation of battery particles for improved durability, controlled release of medication, and many more applications.

Don't hesitate to contact us on info@powall.com for more information.

Keywords

• (Nano) Particles
• Anode
• Atomic Layer Deposition
• Batteries
• Catalysts
• Cathode
• Coatings
• Electrolyzer
• Encapsulation
• Manufacturing
• Molecular Layer Deposition

Address

• Headquarters

  Molengraaffsingel 82629JD DelftZuid-Holland, Netherlands

Team by function

Based on 18 public job profiles as of 4 August 2026.

• Research / R&D10
• Executive / C-Suite4
• Engineering / Software Development3
• Healthcare / Medical1